Use of oxygenated or polyoxygenated weak acids, or minerals, compounds or derivatives that generate same, in copper electrowinning processes in cathodes or anodes of electrolytic cells, originating from the leaching of a copper mineral

ABSTRACT

The invention relates to the use of oxygenated or polyoxygenated weak acids, or minerals or compounds that generate the same to stabilize and buffer the electrolyte solution, thereby improving its conductivity, and/or catalytically promoting copper electrodeposition. 
     Additionally, a copper electrowinning procedure is described that comprises the addition of a necessary quantity of an oxygenated or polyoxygenated weak acid, or mineral or compound that generates the same, to the electrodeposition process; wherein the necessary quantity of weak acid will depend on the characteristics of the mineral, the electrolyte solution, and the current density used. 
     In the invention, the addition of oxygenated or polyoxygenated weak acids, minerals, compounds or derivatives that generate the same to the charged electrolytes coming from the solvent extraction phase and entering the electrowinning (EW) stage serves the purpose of homogenizing the current density within the electrolytic cell, resulting in increased electrical energy consumption efficiency versus the amount of copper deposited.

The invention relates to the use of oxygenated or polyoxygenated weakacids, minerals, compounds or derivatives that generate the same, at anydegree of concentration, in copper electrowinning processes in cathodesor anodes of electrolytic cells from an electrolyte charged with coppersulfate originating from the leaching of a copper mineral.

The invention relates to the addition of oxygenated or polyoxygenatedweak acids, minerals, compounds or derivatives that generate the same,to the charged electrolytes coming from the solvent extraction phase andentering the electrowinning (EW) stage in order to homogenize thecurrent density within the electrolytic cell, resulting in increasedelectrical energy consumption efficiency versus the amount of copperdeposited.

Electrowinning (EW) or electrodeposition is one of the processes torecover-in pure form and selectively-metals that are in solution, andconsists of recovering the metal from a properly conditioned leachsolution (electrolyte solution), and depositing it on a cathode using anelectrolysis process.

In the copper production process, electrowinning is a highly relevantstage, as copper for industrial use requires a purity grade establishedby electrolytic copper standards.

In the electrowinning (EW) process, a direct electric current of lowvoltage and high intensity circulates through the electrolytic solutionbetween an anode, the solution itself, and a cathode. In this way, themetal ions of interest (cations) are attracted to the cathode(negatively charged pole), where they are deposited, and the impuritiesare dissolved in the electrolyte solution, or are precipitated asresidue or anode slimes.

Through the electrowinning process, it is possible to recovermetals-such as copper, gold, and silver-from leachable resources thatwould otherwise be unfeasible.

The processes of purification and concentration of leach solutions, suchas solvent extraction (SX) for copper and activated carbon (AC) forgold, have broadened the scope of application of the electrowinningprocess to recover these metals. So much so that some metals, like zinc,rely almost exclusively on electrowinning to achieve a recovery that iseconomically viable.

The electrowinning process is also a very competitive alternative totreat copper-cobalt and nickel-cobalt combined minerals.

To perform the electrowinning process, electrolytic cells with electriccircuitry are required to circulate a direct electric current of lowvoltage and high intensity.

So that the process is carried out efficiently, the following aspectsmust be considered:

a) Circuit Configuration: To provide the direct current required by theelectrolysis process, current rectifier equipment is used to maintainconstant electrical flow characteristics. The technology of rectifiershas evolved, and currently uses transistorized transformer rectifiers.The filter requirements for harmonic current control currentlyconstitute the major factors in the increasing costs of theserectifiers. Filters are used to achieve a better effect with two units(electrowinning cells), instead of one.

b) Electrical connection characteristics: Electrowinning cell electricalconnections are very simple, since they attempt to reduce the distancesfrom rectifiers in direct current and high voltage.

The energy requirements, particularly for electrical current, necessaryfor the electrowinning process are significantly high compared to othertypes of industries. The invention is directed to make electrical energyconsumption in copper mining more efficient, particularly in theelectrowinning process, thereby solving a problem widely recognized inthe industry.

Metal electrowinning is governed by Faraday's Law, which states that:

-   -   The amount of chemical change produced by an electrical current,        i.e., the dissolved or deposited amount of a substance, is        proportional to the amount of electricity passed.    -   The amounts of various substances deposited or dissolved by the        same amount of electricity are proportional to their equivalent        chemical weights.

Faraday's Law states:

${md} = {\frac{P_{at} \times i_{cell} \times A_{t} \times t \times \eta_{c}}{z \times F} = {Q\left\lceil {C_{i} - C_{f}} \right\rceil}}$

Where:

md=mass deposited [mass/time]

P_(at)=molecular weight of the element in study

i_(cell)=current density of the cell

A_(t)=total area exposed to deposition

t=exposure time

η_(c)=current efficiency (90-92%)

Z=number of electrons exchanged in the deposition reaction.

F=Faraday constant (96.500[c/g-eq]

Q=solution volumetric flow

[C_(i)-C_(f)]=change in concentration of the element of interest in theelectrowinning stage.

The role played by oxygenated or polyoxygenated weak acids-such as boricacid or orthophosphoric acid-, minerals, compounds or derivatives of thesame, at any degree of concentration in the electrowinning processes ofmetal ions in cathodes has a relationship with stabilizing and bufferingthe electrolyte solution, improving its conductivity, especially innear-surface electrode layers, as well as catalytically promotingelectrodeposition, even in processes with high current intensity andhigh speed cation deposition.

Additionally, it controls and stabilizes the system's hydrogen iondischarge, as well as the homogenous distribution of current in theelectrolytic cell, making current use more efficient.

The invention relates to the use of oxygenated or polyoxygenated weakacids, preferably, but not limited to boric acid and orthophosphoricacid in the copper electrowinning process in order to homogenize thecurrent density in the electrolytic cell, resulting in increasedelectrical energy consumption efficiency versus the amount of copperdeposited.

The invention also relates to a copper electrowinning process usingoxygenated or polyoxygenated weak acid, or a mineral or compound thatgenerates the same on the spot, whereby increased electrical energyconsumption efficiency versus the amount of copper deposited isachieved.

In the invention, boric acid refers to H₃BO₃ (trioxoboric (III) acid,B(OH)₃, also called orthoboric acid), or their derivatives. Boronminerals refers, without limitation, to ulexite, colemanite, kernite,pandermite, bakerite, datolite, elbaite, admontite, aksaite, ameghinite,ammonioborite, aristarainite, avogadrite, axinite, bandylite,barberiite, behierite, berborite, biringuccite, boracite, boralsilite,borax, borazon, borcarite, bormuscovite, cahnite, calciborite,carboborite, chambersite, charlesite, congolite, danburite, datolite,diomignite, dravite, dumortierite, eremeevite, ericaite, ezcurrite,fabianite, ferruccite, flolovite, fluoborite, foitite, frolovite,garrelsite, gaudefroyite, ginorite, gowerite, halurgite, hambergite,heidornite, henmilite, hexahydroborite, hydroboracite, hydrochlorborite,hilgardite, holtite, howlite, hulsite, hungchaoite, inderborite,inderite, inyoite, jeremejevite, jimboite, kalborsite, karlite, katoite,kornerupine, kotoite, kurnakovite, lardarellite, ludwigite,lueneburgite, luidwigite, manandonite, mcallisterite, metaborite,meyerhofferite, moydite, nasinite, nifontovite, nobleite,nordenskjoeldine, olenite, oyelite, painite, pentahydroborate, pinnoite,povondraite, preobrazhenskite, priceite, pringleite, probertite,reedmergnerite, rhodozite, rivadavite, roweite, sabinite, sakhite,santite, sassolite, sborgite, schorl, seamanite, searlesite,serendibite, sibirskite, sinhalite, solongoite, spurrite, stillwellite,strontioborite, studenitsite, sturmanite, suanite, sulfoborite,sussexite, szaibelyite, teepleite, tertschite, tincalconite, tunellite,tusionite, tyretskite, uralborite, veatchite, boric vesuvianite,vistepite, volkovskite, vonsenite, warwickite, wawayandaite, wighmanite,wiluite, and wiserite, among others.

Boron compounds refers, without limitation, to borax (Na2B4O7.10H₂O orpentahydrate, sodium borate, sodium tetraborate, sodiumheptaoxotetraborate), borates (compounds that contain boron oxoanions,with boron in oxidation state +3), boranes (boron hydrides).

In the invention, phosphoric acid refers to H₃PO₄. (sometimes calledorthophosphoric acid), copper compounds refers, without limitation, tophosphates, phosphonates, phosphoranes, phosphides, sodiumhypophosphite, phosphine oxide, phosphorus pentafluoride, phosphorustrichloride, hexafluorophosphoric acid, phosphorus (III) and (V) oxide,among others. Phosphorus minerals refers, without limitation, tophosphoric rocks, such as, for example, lignite, andalusite, aheylite,aldermanite, alforsite, alluaudite, althausite, amblygonite, anapaite,apatite, arctite, ardealite, arupite, augelite, autunite, babefphite,barbosalite, baricite, barringerite, bassetite, bauxite, bearthite,belovite, benauite, beraunite, berlinite, bermanite, bertossaite,beryllonite, beusite, biphosphamite, bobierrite, boggildite,bonshtedtite, brabantite, bradleyite, brazilianite, brianite,britholite, Brushite, buchwaldite, cacoxenite, canaphite, cassidyite,chalcosiderite, cheralite, churchite, chlorapatite, coffinite,collinsite, coeruleolactite, corkite, cornetite, crandallite,crawfordite, curetonite, cyrilovite, diadochite, dittmarite, dorfmanite,dufrenite, dumontite, earlshannonite, ehrleite, eosphorite,fairfieldite, farringtonite, florencite, fluellite, fluorapatite,fluorellestadite, foggite, fornacite, francoanellite, fransoletite,frondelite, furongite, gainesite, galileiite, gatehouseite, gatumbaite,giniite, girvasite, glucine, gorceixite, gordonite, goyazite,graftonite, grattarolaite, grayite, hentschelite, herderite, heterosite,hinsdalite, holtedahlite, hopeite, hotsonite, hureaulite, hurlbutite,hydroxylapatite, hydroxylherderite, hydroxyl-piromorphite, isokite,jagowerite, kaluginite, kidwellite, kingite, kingsmountite, kintoreite,kleemanite, kolbeckite, koninckite, kosnarite, kovdorskite, kribergite,kryzhanovskite, kuksite, lacroixite, landesite, laubmanite, laueite,lazulite, lehnerite, lermontovite, leucophosphite, libethenite,likasite, lipscombite, liroconite, lithiophilite, lithiophosphatite,lithiophosphate, lomonosovite, ludlamite, luneburgite, magniotriplite,mahlmoodite, mangangordonite, maricite, matulaite, metaankoleite,metaswitzerite, metatorbenite, metavariscite, metavauxite, mimetite,mitridatite, monazite, monetite, montebrasite, montgomerite, moraesite,moreauite, morinite, mundite, nabaphite, nafedovite, nalipoite, nasicon,nastrophite, natrophilite, natrophosphato, nefedovite, newberyite,niahite, ningyoite, nissonite, olympite, overite, oxyapatite,parafransoletite, parahopeite, paravauxite, parsonite, paulkellerite,petersite, phosphammite, phosphoellenbergerite, phosphoferrite,phosphofibrite, phosphophyllite, phosphorroslerite, phosphosiderite,phosphovanadylite, phosphuranylite, phosinaite, phuralumite, phurcalite,pyromorphite, pyrophosphite, plumbogummite, pretulite, pseudolaueite,pseudomalachite, purpurite, reichenbachite, robertsite, rockbridgeite,rodolicoite, sabugalite, saleeite, sampleite, satterlyite, scholzite,schreibersite, scorzalite, seamanite, segelerite, senegalite, sengalite,sidorenkite, sieleckiite, sigloite, silicocarnotite, spencerite,stercorite, stewartite, strengite, strunzite, struvite, svanbergite,switzerite, taranakite, tarbuttite tavorite, threadgoldite, tinsleyite,tinticite, triangulite, triphylite, triplite, triploidite, trolleite,turquoise, uralolite, ushkovite, vanmeerscheite, variscite, varulite,vashegyite, vayrynenite, veszelyite, viitaniemiite, vitusita, vivianite,vochtenite, voggite, vuonnemite, vyacheslavite, wagnerite, wardite,wavellite, whitmoreite, wolfeite, woodhouseite, wooldridgeite,ximengite, zairite, zapatalite, zodacite.

In general, the solutions proposed by the industry to reduce the amountof energy (such as electric current) are aimed at physical changes inthe electrowinning process. However, the use of weak acids, such asboric or phosphoric acid, to stabilize and buffer the electrolytesolution to improve its conductivity has not been described.

In U.S. Pat. No. 5,882,502 an electrochemical system that allows metalsfrom other compounds to be separated and recovered through a chemicalcell system consisting of an anode and a cathode with separate sectionsconnected by a conductor is presented. Herein an alkaline electrolyte,consisting of ammonium, ammonium sulfate, or ammonium chloride, themetal ion to separate, and a halogen ion, such as bromine or a boroncompound, as a reaction catalyst, is described. The extraction is frommetal oxides, particularly nickel, cobalt, and copper.

However, in U.S. Pat. No. 5,882,502, no reference is made to particularboron compounds, let alone to the possibility of the presence of a weakacid such as boric or phosphoric acid, nor specific compounds that canbe used. As a result, the choice of a weak acid, or a mineral thatgenerates the same is not made clearly therein.

Borate compounds are used in the non-metallic mining industry. One ofthe main boron compound minerals is ulexite (NaCaB₅O₉.8H₂O); thisnaturally-occurring borate is used in non-metallic mining to produce orextract boric acid, borax, and other derivatives.

The use of ulexite has been described on the industrial manufacturinglevel in agriculture and forestry as fertilizer material.

Other boron derivatives, such as borax and boric acid have been used asfertilizers and preservatives in the food industry.

Additionally, borax, which is a soluble borate, is used in miningtogether with ammonium as an iron and steel smelting mixture due to itsability to reduce the mixture melting point and thereby eliminate theiron oxide contaminant from the system. Additionally, the use of boraxhas been described in the smelting of gold and silver jewelry.

Boric acid, as such, is used in the manufacture of fiberglass, fireretardants, borosilicate glass, soaps, detergents, and certainpharmaceutical products. With regard to boric acid, it is used as anantiseptic, an antibacterial, to formulate insecticides, as well as inbuffer solution compounds and as a food preservative. Industrially,boric acid is recognized as raw material in the manufacture of themonofibers that make up textile fiberglass, which is used as thestructural base of plastics and circuitry. Additionally, the use ofboric acid has been described as a manufacture material for dynamite andweapons of mass destruction.

With regard to another weak acid that is particularly relevant to theinvention, such as orthophosphoric acid and its derivatives, the use ofpolyphosphates due to their high solubility in concentrated liquidfertilizers has been specified, as well as their mining and industrialuse as metal chelating agents. Additionally, the use of sodium andcalcium polyphosphates in the food industry and in detergent preparationhas been described. Other phosphates, in the form of ammonium salts arewidely used as raw material in fertilizer manufacturing. In the miningand jewelry industry, phosphate compounds, such as manganese phosphate,are used to prevent metal corrosion and to improve lubrication.Similarly, zinc phosphate is used to prevent metal oxidation. Finally,phosphoric acid, as such, is used as an ingredient in soft drinks, as awater softener, in fertilizer and detergent production, and in themining industry as an anticorrosive and antireduction substance, and asan agent to prevent gas evaporation.

In no case is the traditional use of oxygenated and polyoxygenated weakacids consistent with the proposed use and procedure of the invention.

Below are examples which illustrate the significant improvement that theuse of oxygenated or polyoxygenated weak acids, particularly boric acid,provides in the electrowinning process.

EXAMPLE 1 Effect of the Addition of Boric Acid in the CopperElectrowinning Stage in the Metal Leaching Process

In this example, the effect of the addition of boric acid in the copperelectrowinning process is illustrated, in contrast to a test without theaddition of the acid. For the electrowinning, a synthetic electrolytesolution (10 L) composed of copper pentahydrate sulfate, water, andsulfuric acid (180 g/L) was prepared. Batch tests were prepared (5batches), testing two systems with different current densities (320 and390 A/m²,) simultaneously, with boric acid incorporated and withoutadding boric acid to the cell. For each system, the voltage and amperagewere set at 2V and 2 A, respectively, allowing for continuousfunctioning for 10 hours at room temperature. Finally, to determine theamount of copper electrodeposited on the cathode, the initial mass ofthe electrode was subtracted from the final mass of the electrode.

The results indicate that the proposed addition of boric acid by theinventor progressively improves the electrowinning current efficiency incomparison to the electrolyte solution without the addition of the acid(FIG. 1). Additionally, electrowinning parameters in systems withdifferent current densities were measured, both with and without theaddition of boric acid during the process. As a result, an increase inthe copper mass deposited experimentally by adding boric acid to thesystem was observed, independent of the current density applied. Thus,in the system with a current density of 320 A/m², under normalconditions the deposited mass was observed to be 21.83 g, while theaddition of boric acid increased the amount to 22.65 g (Table 1). Whenthe cathode was operated at a current density of 390 A/m², a copperdeposit of 2.4416 g/h was obtained in the normal system without boricacid, in contrast to the 2.4896 g/h deposited with the addition of boricacid to the cathode (Table 2).

TABLE 1 Copper electrowinning parameters in cathodes with and withoutboric acid at a current density of 320 A/m². Cathode without Cathodewith Parameter boric acid boric acid Voltage 2.00 V 2.00 V Currentdensity 320 A/m² 320 A/m² Test time 10 hr 10 hr ER Cu Concentration 47.2g/L 44.37 g/L EP Cu Concentration 41.31 g/L 38.45 g/L Theoretical massof cathode 23.59 g 23.71 g according to Faraday's Law Experimental massdeposited 21.83 g 22.65 g Actual current efficiency 92.5% 95.5%

Where ER is electrolyte rich, and EP is electrolyte poor.

TABLE 2 Copper electrowinning parameters in cathodes with and withoutboric acid at a current density of 390 A/m². Cathode without Cathodewith Parameter boric acid boric acid Voltage 2.00 V 2.00 V Currentdensity 390 A/m² 390 A/m² Test time 10 hr 10 hr ER Cu Concentration49.25 g/L 39.72 g/L EP Cu Concentration 41.47 g/L 32.09 g/L Theoreticalmass of cathode 24.90 g 24.42 g according to Faraday's Law Experimentalmass deposited 24.16 g 24.2 g Actual current efficiency 97.0% 99.1%

Where ER is electrolyte rich, and EP is electrolyte poor.

In Tables 1 and 2,

-   -   Copper experimental mass deposited=Final cathode mass-initial        cathode mass.    -   The experimental deposited mass is also calculated as the        difference between the copper concentration of the electrolyte        rich solution and the electrolyte poor solution by using the        following equation:

masa_(depositada)=(Cu_(ER)−Cu_(EP))*Q*t, where Cu_(ER): is the copperconcentration in the electrolyte rich solution; Cu_(EP): is the copperconcentration in the electrolyte poor solution; Q: electrolyte flow; t:exposure time

${{Current}\mspace{14mu} {efficiency}} = {\eta = {100*{\frac{{masa}\mspace{14mu} {experimental}}{{masa}_{teórica}}.}}}$

Where:

-   -   theoretical mass=m=I*t*eq/F, where m: electrochemically reactive        mass; I: current intensity; t: time; F: Faraday constant; eq:        equivalents, where eq=PM/Z.

EXAMPLE 2 Effect of the Addition of Orthophosphoric Acid in the CopperElectrowinning Stage in the Leaching Process.

Following the same protocol described in Example 1, but now usingorthophosphoric acid in the copper electrowinning stage in the leachingprocess.

Below are the results obtained, which illustrate how a greater mass ofcopper deposited was obtained using this weak acid.

TABLE 3 Copper electrowinning parameters in cathodes withoutorthophosphoric acid and with the addition of different volumes of theacid at a current density of 320 A/m². Cathode Cathode with withoutCathode with ortho- orthophosphoric orthophosphoric phosphoric Parameteracid acid (10 mL) acid (20 mL) Voltage (V) 2 2 2 Current density 320 320320 (A/m²) Test time (hr) 10 10 10 Theoretical mass of 23.59 23.29 23.29cathode according to Faraday's Law (g) Experimental mass 21.83 23 23deposited (g) Actual current 92.5 92.4656 98.7661 efficiency (%)

TABLE 4 Copper electrowinning parameters in cathodes withoutorthophosphoric acid and with the addition of different volumes of theacid at a current density of 390 A/m². Cathode Cathode with withoutCathode with ortho- orthophosphoric orthophosphoric phosphoric Parameteracid acid (10 mL) acid (20 mL) Voltage (V) 2 2 2 Current density 390 390390 (A/m²) Test time (hr) 10 10 10 Theoretical mass of 24.90 24.86 25.43cathode according to Faraday's Law (g) Experimental mass 24.16 24.8225.28 deposited (g) Actual current 97.0 99.8545 99.4295 efficiency (%)

In Table 5, the effect of the addition of orthophosphoric acid on copperelectrowinning current efficiency is described, and an increase incurrent efficiency by using orthophosphoric acid in the process can beseen.

TABLE 5 Effect of the addition of orthophosphoric acid in copperelectrowinning current efficiency. Cathode with Cathode with CurrentCathode without orthophosphoric orthophosphoric density orthophosphoricacid acid (A/m²) acid (10 mL) (20 mL) 320 92.5 A/m2 92.46 A/m2 98.76A/m2 390 97.0 A/m2 99.85 A/m2 99.43 A/m2

FIGURE DESCRIPTION

FIG. 1. Effect of the addition of boric acid on current efficiency incopper electrodeposition tests. The axes indicate current efficiency (%)with respect to current density (A/m²) generated in the electrolytesolution with boric acid and without boric acid. Where the line markedwith•corresponds to the electrolyte solution when boric acid is added tothe system, and the line marked with X corresponds to the electrolytesolution without boric acid treatment.

FIG. 2. Effect of the addition of orthophosphoric acid on currentefficiency in copper electrodeposition tests. The axes indicate currentefficiency (%) with respect to current density (A/m²) generated in theelectrolyte solution without orthophosphoric acid and with the additionof 10 and 20 mL of orthophosphoric acid. Where the line markedwith•corresponds to the electrolyte solution without orthophosphorictreatment, the line marked with X corresponds to the test adding 10 mLof orthophosphoric acid, and the line marked with ▪ corresponds to thetest adding 20 mL of orthophosphoric acid.

1. Use of oxygenated or polyoxygenated weak acids, or minerals orcompounds that generate the same COMPRISING stabilization and bufferingof the electrolyte solution, thereby improving its conductivity, and/orcatalytically promoting copper electrodeposition, even in processes withhigh current intensity and high speed cation deposition
 2. Use ofoxygenated or polyoxygenated weak acids, or minerals or compounds thatgenerate the same in a copper electrodeposition process of claim 1COMPRISING a weak acid that can be, among others, boric acid orphosphoric acid.
 3. Use of oxygenated or polyoxygenated weak acids, orminerals or compounds that generate the same in a copperelectrodeposition process of claim 1 COMPRISING a weak acid that ispreferably boric acid, also called orthoboric acid.
 4. Use of oxygenatedor polyoxygenated weak acids, or minerals or compounds that generate thesame in a copper electrodeposition process of claim 1 COMPRISING a weakacid that is preferably phosphoric acid, also called orthophosphoricacid.
 5. Use of oxygenated or polyoxygenated weak acids, or minerals orcompounds that generate the same in a copper electrodeposition processof claim 1 COMPRISING a material containing boron or phosphorus.
 6. Useof oxygenated or polyoxygenated weak acids, or minerals or compoundsthat generate the same in a copper electrodeposition process of claim 1COMPRISING a material containing boron.
 7. Use of oxygenated orpolyoxygenated weak acids, or minerals or compounds that generate thesame in a copper electrodeposition process of claim 1 COMPRISING amaterial containing phosphorus.
 8. Use of oxygenated or polyoxygenatedweak acids, or minerals or compounds that generate the same in a copperelectrodeposition process of claim 1 COMPRISING the mineral boron thatcan be selected, without limitation, from ulexite, colemanite, kernite,pandermite, bakerite, datolite, elbaite, admontite, aksaite, ameghinite,ammonioborite, aristarainite, avogadrite, axinite, bandylite,barberiite, behierite, berborite, biringuccite, boracite, boralsilite,borax, borazon, borcarite, bormuscovite, cahnite, calciborite,carboborite, chambersite, charlesite, congolite, danburite, datolite,diomignite, dravite, dumortierite, eremeevite, ericaite, ezcurrite,fabianite, ferruccite, flolovite, fluoborite, foitite, frolovite,garrelsite, gaudefroyite, ginorite, gowerite, halurgite, hambergite,heidornite, henmilite, hexahydroborite, hydroboracite, hydrochlorborite,hilgardite, holtite, howlite, hulsite, hungchaoite, inderborite,inderite, inyoite, jeremejevite, jimboite, kalborsite, karlite, katoite,kornerupine, kotoite, kurnakovite, lardarellite, ludwigite,lueneburgite, luidwigite, manandonite, mcallisterite, metaborite,meyerhofferite, moydite, nasinite, nifontovite, nobleite,nordenskjoeldine, olenite, oyelite, painite, pentahydroborate, pinnoite,povondraite, preobrazhenskite, priceite, pringleite, probertite,reedmergnerite, rhodozite, rivadavite, roweite, sabinite, sakhite,santite, sassolite, sborgite, schorl, seamanite, searlesite,serendibite, sibirskite, sinhalite, solongoite, spurrite, stillwellite,strontioborite, studenitsite, sturmanite, suanite, sulfoborite,sussexite, szaibelyite, teepleite, tertschite, tincalconite, tunellite,tusionite, tyretskite, uralborite, veatchite, boric vesuvianite,vistepite, volkovskite, vonsenite, warwickite, wawayandaite, wighmanite,wiluite, and wiserite, among others.
 9. Use of oxygenated orpolyoxygenated weak acids, or minerals or compounds that generate thesame in a copper electrodeposition process of claim 1 COMPRISING themineral phosphorus that can be selected, without limitation, fromaheylite, aldermanite, alforsite, alluaudite, althausite, amblygonite,anapaite, apatite, arctite, ardealite, arupite, augelite, autunite,babefphite, barbosalite, baricite, barringerite, bassetite, bauxite,bearthite, belovite, benauite, beraunite, berlinite, bermanite,bertossaite, beryllonite, beusite, biphosphamite, bobierrite,boggildite, bonshtedtite, brabantite, bradleyite, brazilianite,brianite, britholite, brushite, buchwaldite, cacoxenite, canaphite,cassidyite, chalcosiderite, cheralite, churchite, chlorapatite,coffinite, collinsite, coeruleolactite, corkite, cornetite, crandallite,crawfordite, curetonite, cyrilovite, diadochite, dittmarite, dorfmanite,dufrenite, dumontite, earlshannonite, ehrleite, eosphorite,fairfieldite, farringtonite, florencite, fluellite, fluorapatite,fluorellestadite, foggite, fornacite, francoanellite, fransoletite,frondelite, furongite, gainesite, galileiite, gatehouseite, gatumbaite,giniite, girvasite, glucine, gorceixite, gordonite, goyazite,graftonite, grattarolaite, grayite, hentschelite, herderite, heterosite,hinsdalite, holtedahlite, hopeite, hotsonite, hureaulite, hurlbutite,hydroxylapatite, hydroxylherderite, hydroxyl-piromorphite, isokite,jagowerite, kaluginite, kidwellite, kingite, kingsmountite, kintoreite,kleemanite, kolbeckite, koninckite, kosnarite, kovdorskite, kribergite,kryzhanovskite, kuksite, lacroixite, landesite, laubmanite, laueite,lazulite, lehnerite, lermontovite, leucophosphite, libethenite,likasite, lipscombite, liroconite, lithiophilite, lithiophosphatite,lithiophosphate, lomonosovite, ludlamite, luneburgite, magniotriplite,mahlmoodite, mangangordonite, maricite, matulaite, metaankoleite,metaswitzerite, metatorbenite, metavariscite, metavauxite, mimetite,mitridatite, monazite, monetite, montebrasite, montgomerite, moraesite,moreauite, morinite, mundite, nabaphite, nafedovite, nalipoite, nasicon,nastrophite, natrophilite, natrophosphato, nefedovite, newberyite,niahite, ningyoite, nissonite, olympite, overite, oxyapatite,parafransoletite, parahopeite, paravauxite, parsonite, paulkellerite,petersite, phosphammite, phosphoellenbergerite, phosphoferrite,phosphofibrite, phosphophyllite, phosphorroslerite, phosphosiderite,phosphovanadylite, phosphuranylite, phosinaite, phuralumite, phurcalite,pyromorphite, pyrophosphite, plumbogummite, pretulite, pseudolaueite,pseudomalachite, purpurite, reichenbachite, robertsite, rockbridgeite,rodolicoite, sabugalite, saleeite, sampleite, satterlyite, scholzite,schreibersite, scorzalite, seamanite, segelerite, senegalite, sengalite,sidorenkite, sieleckiite, sigloite, silicocarnotite, spencerite,stercorite, stewartite, strengite, strunzite, struvite, svanbergite,switzerite, taranakite, tarbuttite, tavorite, threadgoldite, tinsleyite,tinticite, triangulite, triphylite, triplite, triploidite, trolleite,turquoise, uralolite, ushkovite, vanmeerscheite, variscite, varulite,vashegyite, vayrynenite, veszelyite, viitaniemiite, vitusita, vivianite,vochtenite, voggite, vuonnemite, vyacheslavite, wagnerite, wardite,wavellite, whitmoreite, wolfeite, woodhouseite, wooldridgeite,ximengite, zairite, zapatalite, and zodacite, among others.
 10. Use ofoxygenated or polyoxygenated weak acids, or minerals or compounds thatgenerate the same in a copper electrodeposition process of claim 1COMPRISING a compound that can be, among others, a boron compound. 11.Use of oxygenated or polyoxygenated weak acids, or minerals or compoundsthat generate the same in a copper electrodeposition process of claim 1COMPRISING a compound that can be, among others, a phosphorus compound.12. Use of oxygenated or polyoxygenated weak acids, or minerals orcompounds that generate the same in a copper electrodeposition processof claim 10 COMPRISING a compound that is a boron compound, selectedpreferably, without limitation, from borax, borates, and boranes, amongothers.
 13. Use of oxygenated or polyoxygenated weak acids, or mineralsor compounds that generate the same in a copper electrodeposition ofclaim 11 COMPRISING a compound that is a phosphorous compound,preferably selected, without limitation, from phosphates, phosphonates,phosphoranes, phosphides, sodium hypophosphite, phosphine oxide,phosphorus pentafluoride, phosphorus trichloride, hexafluorophosphoricacid, and phosphorus (III) and (V) oxide, among others.
 14. Use ofoxygenated or polyoxygenated weak acids, or minerals or compounds thatgenerate the same in a copper electrodeposition process of claim 1COMPRISING improved current consumption efficiency and increased copperrecovery from the electrolyte solution.
 15. A copper electrowinningprocedure COMPRISING: Addition of a necessary quantity of an oxygenatedor polyoxygenated weak acid, or a compound or a mineral that generatethe same in said copper electrodeposition process where the necessaryquantity of weak acid will depend on the characteristics of the mineral,the electrolyte solution, and the current density used.
 16. A copperelectrowinning procedure of claim 14 COMPRISING the addition of anoxygenated or polyoxygenated weak acid, preferably, to saidelectrodeposition chamber.
 17. A copper electrowinning procedure ofclaim 15 COMPRISING said weak acid, preferably, boric acid or phosphoricacid.
 18. A copper electrowinning procedure of claim 14 COMPRISING saidmineral added to said electrodeposition process.
 19. A copperelectrowinning procedure of claim 17 COMPRISING said mineral,preferably, a boron or phosphorus mineral.
 20. A copper electrowinningprocedure of claim 17 COMPRISING said compound, preferably, a boron orphosphorus compound.
 21. A copper electrowinning procedure of claim 17COMPRISING said compound, preferably selected from borax, borates, andboranes, among others.
 22. A copper electrowinning procedure of claim 17COMPRISING said compound, preferably selected from borax.
 23. A copperelectrowinning procedure of claim 17 COMPRISING said compound,preferably selected from phosphates, phosphonates, phosphoranes,phosphites, phosphides, sodium hypophosphite, phosphine oxide,phosphorus pentafluoride, phosphorus trichloride, hexafluorophosphoricacid, and phosphorus (III) and (V) oxide, among others.
 24. Use ofoxygenated or polyoxygenated weak acids, or minerals or compounds thatgenerate the same in copper electrowinning of claim 1 COMPRISING saidacid having a dissociation constant that varies between 1.80×10⁻¹⁶ and55.50.